专利名称:Valve apparatus and method of
manufacturing the same
发明人:Tsuji, Daisuke,Shindo, Osamu申请号:EP14171328.9申请日:20140605公开号:EP2811211A2公开日:20141210
专利附图:
摘要:According to one embodiment, there is provided a valve apparatus including acladding portion that is integrally formed on a sliding-contact surface of either a valverod (205) or a valve body (204), which serves as a movable member, wherein the cladding
portion is formed by inducing a pulsed discharge between an electrode, which is formedof a molded body consisting mainly of a metal, and a treatment target portion of eitherthe valve rod (205) or the valve body (204), so as to weld and deposit a material of theelectrode on a surface of the treatment target portion; and a surface layer that isintegrally formed on a sliding-contact surface of either a bushing (201) or a sleeve, whichserves as a stationary member, wherein the surface layer is formed by forming a firstcoating film by surface-hardening heat treatment using a metallic cementation.
申请人:Kabushiki Kaisha Toshiba
地址:1-1, Shibaura 1-chome, Minato-ku, Tokyo 105-8001 JP
国籍:JP
代理机构:Henkel, Breuer & Partner
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